Optical thin-film materials

Since 2002, USTRON has been involved in the manufacture and sale of a variety of high-purity vacuum vapor deposition materials at our factories in China.

We provide a variety of vacuum vapor deposition materials, including oxides, fluorides, sulfides and pure metals, etc. We can also fabricate thin-film materials in a range of different shapes or sizes depending on the hearth liner.

We can accommodate a diverse range of customer needs.

Low refractive index materials

Product name	Chemical symbol	Refractive index （550nm）	Arch-shaped	Tablet	Granular
Magnesium fluoride	MgF2	1.38	-	○	○
Calcium fluoride	CaF2	1.42	-	-	○
Silicon dioxide	SiO2	1.46	○	○	○
MU1	SiO2+Al2O3	1.48	-	-	○

Medium refractive index materials

Product name	Chemical symbol	Refractive index （550nm）	Arch-shaped	Tablet	Granular
Lanthanum fluoride	LaF3	1.58	-	-	○
Cerium fluoride	CF3	1.63	-	-	○
Aluminum oxide	Al2O3	1.63	○	○	○
Magnesium oxide	MgO	1.70	-	-	○
MG-01	Al2O3+La2O3	1.70	-	-	○
Yttrium oxide	Y2O3	1.87	-	-	○

High refractive index materials

Product name	Chemical symbol	Refractive index （550nm）	Arch-shaped	Tablet	Granular
Silicon monoxide	SiO	1.90	-	○	○
Hafnium oxide	HfO2	1.95	-	○	○
Zirconium oxide	ZrO2	2.05	○	○	○
GL2	Ta2O5+ZrO2	2.10	-	○	-
Tantalum pentoxide	Ta2O5	2.10	-	○	○
MU5	ZrO2+TiO2	2.10	○	○	-
MU2	LaTiO3	2.10	-	○	○
GL7	Ta2O5+TiO2	2.13	-	○	○
MU2-C	LaTiO3	2.15	-	○	○
Niobium pentoxide	Nb2O5	2.25	-	-	○
Cerium oxide	CeO2	2.35	-	-	○
Titanium monoxide	TiO	2.35	-	○	○
Titanium dioxide	TiO2	2.35	-	○	○
Titanium trioxide	Ti2O3	2.35	-	○	○
MU3	Ti3O5	2.35	-	○	○
Zinc sulfide	ZnS	2.4/1200nm	-	-	○
Silicon	Si	3.4/3000nm	-	○	○
Germanium	Ge	4.4/2000nm	-	○	○

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